Bi2Te3 Thin Films Grown by Magnetron Sputtering

Bi2Te3 thin films grown the substrate with 80 nm in diameter have been prepared by using magnetron sputtering technique. The structure of thin films was determined by X-ray diffraction experiments. The average grain size and particle size in these powers were measured by the line profile analysis method of X-ray diffraction patterns and by scan electron microscopy, respectively. The thin films were investigated by using SEM measurements. The results indicate that Bi2Te3 alloys could be potentially important TE materials for many applications, especially for prolonged TE device operation at high temperatures, such as for recovery of waste heat from automobile, aircrafts, and power plants due to their superiorphysical properties, including the ability of operating at high temperature/high power conditions, high mechanical strength and stability, and radiation hardness.