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Ultra thin TiO2 films deposited by atomic layer chemical vapor deposition
Ultra thin TiO2 films deposited by atomic layer chemical vapor deposition
2000
Mikael Schuisky
Kaupo Kukli
Aleks Aidla
Jaan Aarik
M Ludvigsson
Anders Hårsta
Keywords:
Thin film
Hybrid physical-chemical vapor deposition
Combustion chemical vapor deposition
Electron beam physical vapor deposition
Physical vapor deposition
Plasma-enhanced chemical vapor deposition
Pulsed laser deposition
Atomic layer deposition
Inorganic chemistry
Materials science
Chemical engineering
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