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Vanadium oxide thin films grown by ALD using TEMAV and O3 or H2O precursors
Vanadium oxide thin films grown by ALD using TEMAV and O3 or H2O precursors
2012
Antony Premkumar Peter
Michael Toeller
Iuliana Radu
Christoph Adelmann
Marc Schaekers
Johan Meersschaut
Thierry Conard
Malgorzata Jurczak
Sven Van Elshocht
Keywords:
Vanadium oxide
Thin film
Materials science
Inorganic chemistry
Chemical engineering
vanadium oxide thin films
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