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Multilayer Resist Profile Control in Oxygen Reactive Ion Etching Using Ethanol Gas Mixture ( Plasma Processing)
Multilayer Resist Profile Control in Oxygen Reactive Ion Etching Using Ethanol Gas Mixture ( Plasma Processing)
1994
Yasuki Kimura
Ryouichi Aoyama
Seki Suzuki
Keywords:
Oxygen
Reactive-ion etching
Ethanol fuel
Plasma processing
Ethanol
Plasma etcher
Resist
Inorganic chemistry
Chemistry
Analytical chemistry
Chemical engineering
Materials science
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