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Molecular Dynamics Simulation of the Resist Filling Process in UV-nanoimprint Lithography
Molecular Dynamics Simulation of the Resist Filling Process in UV-nanoimprint Lithography
2021
Hiroki Uchida
Ryosuke Imoto
Tadashi Ando
Takao Okabe
Jun Taniguchi
Keywords:
Materials science
Nanoimprint lithography
Molecular dynamics
process
Resist
Nanotechnology
Correction
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