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Analysis on Radical Photo- and Thermal-Polymerization of Negative-Tone Acrylic Resist for High Resolution
Analysis on Radical Photo- and Thermal-Polymerization of Negative-Tone Acrylic Resist for High Resolution
2015
Emiko Oota
Shota Okade
Yukiko Muramatsu
Ken Sawabe
Yasuharu Murakami
Keywords:
Organic chemistry
Materials science
Photochemistry
Polymerization
Resist
high resolution
Thermal
Correction
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