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Study of Coating Process for Various Photo-resists using Minimal Fab Coater
Study of Coating Process for Various Photo-resists using Minimal Fab Coater
2021
Shuhei Nakamichi
Hiroyuki Tanaka
Fumito Imura
Shuichi Noda
Sommawan Khumpuang
Shiro Hara
Keywords:
Materials science
Photoresist
Resist
Spin coating
Nanotechnology
Coating
Correction
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