Dynamics and Structure Formation of Confined Polymer Thin Films Supported on Solid Substrates

2021 
The stability/instability behavior of polystyrene (PS) films with tunable thickness ranging from higher as-cast to lower residual made on Si substrates with and without native oxide layer was studied in this paper. For further extraction of residual PS thin film (hresi) and to investigate the polymer–substrate interaction, Guiselin’s method was used by decomposing the polymer thin films in different solvents. The solvents for removing loosely adsorbed chains and extracting the strongly adsorbed irreversible chains were selected based on their relative desorption energy difference with polymer. The PS thin films rinsed in chloroform with higher polarity than that of toluene showed a higher decrease in the residual film thickness but exhibited earlier growth of holes and dewetting in the film. The un-annealed samples with a higher oxide film thickness showed a higher decrease in the PS residual film thickness. The effective viscosity of PS thin films spin-coated on H-Si substrates increased because of more resistance to flow dynamics due to the stronger polymer–substrate interaction as compared to that of Si-SiOx substrates. By decreasing the film thickness, the overall effective mobility of the film increased and led to the decrease in the effective viscosity, with matching results of the film morphology from atomic force microscopy (AFM). The polymer film maintained low viscosity until a certain period of time, whereupon further annealing occurred, and the formation of holes in the film grew, which ultimately dewetted the film. The residual film decrement, growth of holes in the film, and dewetting of the polymer-confined thin film showed dependence on the effective viscosity, the strength of solvent used, and various involved interactions on the surface of substrates.
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