Old Web
English
Sign In
Acemap
>
Paper
>
High Aspect Ratio SiO2 Capillary Based On Silicon Etching and Thermal Oxidation Process for Optical Modulator
High Aspect Ratio SiO2 Capillary Based On Silicon Etching and Thermal Oxidation Process for Optical Modulator
2015
Nguyen Van Toan
Suguru Sangu
T Saitoh
Naoki Inomata
Takahito Ono
Keywords:
Etching
Capillary action
Thermal oxidation
Silicon
Analytical chemistry
Materials science
Optical modulator
Aspect ratio (aeronautics)
Nanotechnology
silicon etching
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]