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Influence of Residual Fluorine on Internal Stress of W Thin Films
Influence of Residual Fluorine on Internal Stress of W Thin Films
2017
Yoshinori Tokuda
Kazunori Harada
Satoshi Ishikawa
Shunsuke Imaizumi
So Takamoto
Satoshi Izumi
Keywords:
Radiochemistry
Tungsten
Thin film
Residual
Fluorine
Materials science
Composite material
internal stress
Correction
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