A study of the influence of a hydrogenated carbon interlayer on the adhesion properties of plasma deposited silica thin films on polycarbonate

In this work we present a new plasma adhesion pretreatment for the the adhesion enhancement of plasma deposited silica layer on PC. After an initial oxygen plasma etching of the polycarbonate surface, a thin hydrogenated amorphous carbon layer is deposited before the silica layer. This interlayer is found to increase the number of Si-O-C bonds at the interface. The treatment leads to a significant adhesion enhancement and to increased resistance to temperature changes and moisture.