Acid-sensitive arylether-protected poly(4-hydroxystyrene) derivatives for chemically amplified deep-UV positive resists

This paper presents the synthesis, electronic absorption characteristics, thermal stability, acid sensitivity and lithographic potential of (alpha) -methylbenzylether protected poly(hydroxystyrene) derivatives. The results demonstrate the potential of (alpha) -methylbenzylether as an acid labile protecting group in the design of high performance DUV positive tone resist materials.