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Kathleen M. Cornett
Kathleen M. Cornett
IBM
Resist
Chemistry
Photochemistry
Protecting group
Organic chemistry
3
Papers
5
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Effect of acid labile ether protecting groups on the oxide etch resistance and lithographic performance of 248-nm resists
2000
Pushkara Rao Varanasi
Kathleen M. Cornett
Margaret C. Lawson
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Acid-sensitive arylether-protected poly(4-hydroxystyrene) derivatives for chemically amplified deep-UV positive resists
1998
Pushkara Rao Varanasi
Kathleen M. Cornett
Ahmad D. Katnani
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Shot-size reduction of photoresist formulations
1995
Wayne M. Moreau
Kathleen M. Cornett
James Thomas Fahey
Leo L. Linehan
Warren Montgomery
Marina V. Plat
Randolph S. Smith
Robert Lavin Wood
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Citations (4)
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