A 45nmNOR Flash Technology withSelf-Aligned Contacts and 0.024ptm2 Cell SizeforMulti-level Applications

A 45nmNOR Flash technology featuring aSelfAligned Contact ETOXarchitecture isdemonstrated ona1GbitMLC product having adieareaof30.05mm2. Thecellsizeof 0.024ptm2 isthesmallest NOR cell reported todateandis manufactured entirely withdrylithography tools. Withan aggressively scaled drain space of100nmandgatelength of 110nm,thecell showsrobust short channel behavior, and excellent cycling behavior.