Evolution of wavelength shrinkage in lithography
2009
Optical lithography has driven on-going miniaturization in the microelectronics industry, thereby enabling continuation
of 'Moore's Law'. To achieve this, lithographers have steadily reduced the wavelength of the illumination light used in
the optical systems. However, as we transition from the visible spectrum, through ultra-violet, and now towards the soft
x-ray wavelength regime, a host of new challenges are introduced. The majority of these challenges are related to
material properties, as wavelength reduction significantly narrows the field of available materials that are both
sufficiently transparent, as well as radiation resistant to the illumination light. We also are limited by the actual
wavelengths that can be produced which deliver sufficient power to provide a production-worthy light source. In this
paper, we will examine the history of wavelength transition in optical lithography, explaining the key material
developments that enabled wavelengths such as 248nm to be highly successful, as well as explain the reasons
wavelengths such as 157nm and 126nm were not adopted.
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