Characterization of the long time oxidation protection of fluorine implanted technical TiAl-alloys using ion beam methods

In the present work the oxidation resistance of fluorine treated technical TiAl-alloys was investigated. Single and double fluorine beam line implantation was found to improve the high temperature oxidation resistance of this class of materials with Al-contents higher than 40 at.%. Calculated and measured fluorine depth profiles were compared. It was shown that the alloying elements do not modify significantly the fluorine profile and do not disturb the halogen effect. After single and double fluorine implantation and for different oxidation stages (isothermal/thermocyclic conditions) the maximum of the fluorine profile was measured by PIGE (Proton Induced Gamma Emission). The fluorine maximum was found to be located at the metal/oxide interface. The time dependence of the fluorine profile was determined as well. Double implantation led to a slower growing alumina layer. In this case a F-reservoir is obtained and improves the long term oxidation resistance of TiAl-based alloys.