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Impact of film structures on damage to low-k SiOCH film during plasma exposure
Impact of film structures on damage to low-k SiOCH film during plasma exposure
2009
Shigeo Yasuhara
Toru Sasaki
Kunitoshi Tajima
Hisashi Yano
Shingo Kadomura
Masaki Yoshimaru
Noriaki Matsunaga
Seiji Samukawa
Keywords:
Radiochemistry
Nanotechnology
Plasma
Materials science
Composite material
plasma exposure
Correction
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