Old Web
English
Sign In
Acemap
>
Paper
>
Highly Material Selective and Self‐Aligned Photo‐assisted Atomic Layer Deposition of Copper on Oxide Materials
Highly Material Selective and Self‐Aligned Photo‐assisted Atomic Layer Deposition of Copper on Oxide Materials
2021
Ville Miikkulainen
Marko Vehkamäki
Kenichiro Mizohata
Timo Hatanpää
Mikko Ritala
Keywords:
Oxide
photo assisted
Materials science
Nanotechnology
Atomic layer deposition
Copper
Correction
Source
Cite
Save
Machine Reading By IdeaReader
30
References
1
Citations
NaN
KQI
[]