Study of the properties of a Si surface layer implanted with 64Zn+ and 16O+ ions during the formation of ZnO nanoparticles under thermal annealing

The cross section of a Si surface layer implanted with 64Zn+ and 16O+ ions is visualized via high-resolution transmission electron microscopy, and its evolution as a result of thermal annealing is investigated. The profiles of impurities implanted into this layer, which are measured by means of secondary-ion mass spectrometry, as well as their changes arising from heat treatment, are analyzed. The surface morphology is examined with the help of atomic-force microscopy.