Two-step process for the growth of uniform core-shell Si nanowires using chlorinated precursors

Abstract Core-shell silicon nanowires (SiNW) were synthesized by two-step in-situ process, thermal chemical vapor deposition and plasma-enhanced chemical vapor deposition at a relatively low-temperature using SiH2Cl2 as precursor gas. Different electron microscopy results shown the formation of random nanowires with homogenous morphology and a core-shell kind of structure. The diameter of the core is found to be around 200 nm with nanocrystalline silicon kind of configuration in the center, whereas the shell principally consists of amorphous silicon/SiOx phases. Also, FTIR analysis showed a high hydrogen content in the nanostructures. The core-shell structure of SiNW has presented an intense visible red luminescence, and this property and its morphology can be used for different optolectronics and biomedical applications.