Corrosion characteristics of TiN prepared by plasma source ion implantation

Summary form only given. The injection of nitrogen ions into pure titanium has been performed by plasma source ion implantation with a negative voltage of 10 kV, a pulse width of 10 /spl mu/s, and a repetition rate of 100 Hz. The titanium sample (15/sup /spl phi///spl times/1.5/sup t/ mm) was immersed in a nitrogen plasma with plasma density range of 10/sup 9/ to 2/spl times/10/sup 10/ cm/sup -3/ an electron temperature of 1.4 eV, and a gas pressure of 8/spl times/10/sup -4/ Torr. A dose was changed from 10/sup 15/ to 10/sup 18/ cm/sup -2/ by varying implantation time and plasma density. The ESCA/AES analysis of nitrogen-ion implanted samples shows the deposition of nitrogen ions with a Gaussian distribution and the formation of TiN in the surface layer. Corrosion characteristics were examined by anodic polarization curves.