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Plasma processes applied to SiO2 cryo-atomic layer etching
Plasma processes applied to SiO2 cryo-atomic layer etching
2019
Antoun Gaelle
Remi Dussart
Philippe Lefaucheux
Thomas Tillocher
Tahara Shigeru
Kumiko Yamazaki
Koichi Yatsuda
Faguet Jacques
Kaoru Maekawa
Keywords:
Etching (microfabrication)
Optoelectronics
Plasma
layer
Materials science
Correction
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