EUV radiation source of high radiation capacity on the basis of a gas discharge.

The arrangement has electrode housing (1, 2), where the housing (1) is provided as a discharge chamber for gas discharge for plasma production. The housing (2) has a pre-ionization unit (7) to generate ionization of a gaseous stannous working medium. A gas supply unit (8) controls temperature and pressure of the medium and has a gas inlet in a vacuum chamber (4). A thermo container (83) and a thermally isolated supply line (81) are provided to transfer the medium from the supply unit to the ionization unit. The line is connected with the housing (1) by the inlet.