Optimization of InGaP metamorphic buffers grown by MOVPE

Abstract Inverted metamorphic multijunction solar cells have shown high solar conversion efficiencies and utilized InGaP based metamorphic (MM) buffers to change the lattice constant using compositional graded buffer layers while minimizing dislocation density in the final material layers. In this study, optimization of InGaP metamorphic buffers was done by systematically exploring key metalorganic vapor phase epitaxy (MOVPE) growth conditions and the MM buffer epitaxial stack structure. To optimize MOVPE growth parameters, growth temperature and V/III ratio were varied during the growth of a standard MM buffer test structure and the final InGaP buffer layer was characterized by photoluminescence, X-ray reciprocal space maps, atomic force microscope, cathodoluminesence, and ex situ bow measurements. The in situ measurement of wafer curvature was also monitored during MM buffer layer growth. Evaluation of material characterization data provided optimized growth conditions for the InGaP based MM buffer. The second part of this study evaluated the actual layer thickness and number of compositional graded steps in a MM buffer. Our results showed that in situ deflectometer measurements of the wafer curvature of the MM buffer layer can be correlated to ex situ determined strain relaxation of the final buffer layer of the MM buffer. Process optimization tests showed a growth temperature of 580 °C with a V/III ratio of 37 provided for the best surface roughness, highest PL intensity and also allowed for low dislocation defect density of the final buffer layer. Using the optimized growth conditions, further optimization of the step grade layers showed that a 350 nm thick grade layer for a six step layer MM buffer for a final buffer composition targeted for In 0.8 Ga 0.2 P provided the best surface roughness and 100% final buffer relaxation.