Flash LampAnnealing Latest Technology for45nmdevice andFuture devices

FLA (Flash Lamp Annealing) isusedin65nm generation devices manufacturing. Fornext45nmandfuture generation devices, wehave picked up3keysubjects related tomilli-second annealing. Process controllability, S/D(Source Drain) activation, Silicidation. No needtosay,process controllability isveryimportant fordevice manufacturing. Andprocess requirement forS/Dactivation andsilicidation controllability isbecoming moreandmoresevere. Underevaluation ofthese subjects, itbecameclear thatFLAtechnology isstill ahopeful candidate for 45nmdevice andfuture.