Plasma enhanced aerosol–gel method: a new way of preparing ceramic coatings

The sol–gel process is widely used for the production of powders, coatings and bulk materials. However, being a wet-chemical technique, it has certain limitations related to properties of aqueous colloidal solution, especially when applied as a coating. The most frequently used methods, such as dip- and spin-coating, are difficult to apply onto more complex substrates. In these cases, the aerosol–gel deposition method can be regarded as the solution of this problem. In the present article, a novel plasma enhanced aerosol–gel method of coatings production is presented. A novelty of this method is based on an integration of the aerosol–gel deposition of thin films and their low temperature plasma treatment. Owing to the above, all stages of the coatings production process—substrate preparation, film deposition, and its plasma treatment, can be carried out in a single reactor. The design and operational scheme of such device is presented in this work. Using this device, thin coatings were first deposited on substrates and then plasma treated. The effect of deposition and plasma discharge conditions on morphology and chemical structure of the films has been studied. It was found that plasma treatment had a substantial influence on all the examined properties of the aerosol–gel deposited coatings.