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In Situ Dielectric Al2O3/β-Ga2O3 Interfaces Grown Using Metal–Organic Chemical Vapor Deposition
In Situ Dielectric Al2O3/β-Ga2O3 Interfaces Grown Using Metal–Organic Chemical Vapor Deposition
2021
Saurav Roy
Adrian Chmielewski
Arkka Bhattacharyya
Praneeth Ranga
Rujun Sun
Michael A. Scarpulla
Nasim Alem
Sriram Krishnamoorthy
Keywords:
Materials science
Metal
In situ
fixed charge
Dielectric
Chemical engineering
Chemical vapor deposition
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