Fabrication of tunnelling gap of nanomechanicalaccelerometer by focused ion beam

The two-layer polysilicon surface micromachining process flow of nanomechanical accelerometerincluded a high aspect-ratio etch step was presented.In the experiments we defined modes, and developed the technology of tunnelling gap formation using focused ion beam. The nanomechanical accelerometer crystals were fabricated by surface micromachining and focused ion beams.