An experimental and simulation study of pnp Si/SiGeC HBTs using box-like Ge profiles

In this paper, we describe the development of a pnp SiGeC HBT using a self-aligned selective epitaxy emitter/base architecture. The device physics and the impact of the valence band barriers taking place in pnp HBTs are detailed. The Ge and impurities profiles optimization necessary to limit their negative influence is particularly described. Static and dynamic device characteristics are discussed.