In situ scanning tunneling microscopy study of 2-mercaptobenzimidazole local inhibition effects on copper corrosion at grain boundary surface terminations

Abstract New insight on local inhibition effects of 2-mercaptobenzimidazole (MBI) on early stage intergranular corrosion of copper in hydrochloric acid solution is reported from in situ analysis at the nanometer scale and comparison with 2-mercaptobenzothiazole (MBT) effects in the same pre-adsorption and corrosion testing conditions. Macroscopic cyclic voltammetry analysis, including grains and grain boundary (GB) network, showed a passivation-like behavior in the Cu(I) oxidation range, specific to MBI since not observed with MBT and assigned to the anodic formation of a surface film of Cu(I)-MBI reaction products protecting against dissolution. Electrochemical scanning tunneling microscopy analysis revealed net intergranular dissolution, mitigated by the imperfect protection provided by the anodically formed MBI layer. It also showed local accumulation of reaction products in the GB surface regions, blocking preferential dissolution. For random GBs, blocking by local accumulation of reaction products was dominant, in agreement with the expected higher reactivity of these GBs generating more Cu(I) ions under anodic polarization and thus less efficiently protected by the anodically formed MBI layer. For Coincidence Site Lattice (CSL) boundaries, mitigated net dissolution was more frequently observed. Coherent twins showed equally efficient inhibition in the GB surface region than on adjacent grains. MBI inhibition was less efficient than MBT inhibition with more Cu(I) reaction products generated on the grains to form a surface film and their preferential local accumulation more frequently observed in the GB surface regions.