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Goh Matsuura
Goh Matsuura
Materials science
Silicon nitride
Plasma etching
Etching (microfabrication)
Silicon oxide
2
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Nitride etching with hydrofluorocarbons. I. Selective etching of nitride over silicon and oxide materials by gas discharge optimization and selective deposition of fluorocarbon polymer
2017
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Sebastian Engelmann
Robert L. Bruce
Eric A. Joseph
Nicholas C. M. Fuller
William S. Graham
E. Sikorski
Mahmoud Kohjasteh
Yu Zhu
Masahiro Nakamura
Azumi Ito
Hirokazu Matsumoto
Goh Matsuura
Takefumi Suzuki
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Increase an etching speed for a silicon-etching process by pre-treatment of an etching chamber
2015
Eric A. Joseph
To Bang
E. Sikorski
Masahiro Nakamura
Goh Matsuura
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