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Akifumi Gawase
Akifumi Gawase
Toshiba
Dielectric
Materials science
Copper
Porosity
Oxide
2
Papers
9
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0
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Robust BEOL Process Integration with Ultra Low-k (k=2.0) Dielectric and Self-Formed MnO x Barrier Technology for 32 nm-node and beyond
2008
IITC | International Interconnect Technology Conference
T. Watanabe
Yumi Hayashi
H. Tomizawa
Takamasa Usui
Akifumi Gawase
Miyoko Shimada
K. Watanabe
Hideki Shibata
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Citations (2)
Self-Formed Barrier Technology using CuMn Alloy Seed for Copper Dual-Damascene Interconnect with porous-SiOC/porous-PAr Hybrid Dielectric
2007
IITC | International Interconnect Technology Conference
Takeshi Watanabe
Hayato Nasu
Gaku Minamihaba
N. Kurashima
Akifumi Gawase
Miyoko Shimada
Yasuhito Yoshimizu
Yoshihiro Uozumi
Hideki Shibata
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Citations (7)
1