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Adder Lee

United Microelectronics Corporation

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Characterization of quartz etched depth and optical density of opaque pattern for the wafer CD behavior on advanced mask

2019
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Hotspot analysis and empirical correction through mask and wafer technology harmonization

2018
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The CD control improvement by using CDSEM 2D measurement of complex OPC patterns

2016
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In die mask overlay control for 14nm double-patterning lithography

2015
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