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Seiichi Ishikawa
Seiichi Ishikawa
Fujitsu
Lithography
Organic chemistry
Vinyl alcohol
Thickening
Resist
2
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A Resolution Enhancement Material for 193-nm Lithography Comprising 2-Hydroxybenzyl Alcohol and Poly(vinyl alcohol) with Uniform Resist Pattern Shrinkage
2011
Journal of Photopolymer Science and Technology
Koji Nozaki
Miwa Igarashi
Ei Yano
Seiichi Ishikawa
Hajime Yamamoto
Satoru Asai
Takaki Kanbara
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Optimization of contact hole lithography for 65-nm node Logic LSI
2006
Yuji Setta
Hiroki Futatsuya
Atsushi Sagisaka
Tatsuo Chijimatsu
Takayoshi Minami
Fumitoshi Sugimoto
Seiichi Ishikawa
Satoru Asai
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