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Byounghoon Seung
Byounghoon Seung
Samsung
Optoelectronics
Etching
Materials science
Nanotechnology
Immersion lithography
3
Papers
1
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0
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Development of high-transmittance phase-shifting mask for ArF immersion lithography
2015
Won-Suk Ahn
Hwan Seok Seo
Ju-Mi Bang
Ji-Young Kim
Jaemin Song
Byounghoon Seung
Hee Bom Kim
Chan Uk Jeon
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30nm full field quartz template replicated from Si master for FLASH active layer NIL
2011
Du Hyun Lee
Byung Kyu Lee
Woong Ko
Jae-Kwan Kim
Kiyeon Yang
Byounghoon Seung
Il-Yong Jang
Mun-Ja Kim
Byung Gook Kim
ChangMin Park
Jeongho Yeo
Chang Youl Moon
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The novel plasma etching process for defect reduction in photomask fabrication
2009
Ji-hyun Lee
Il-Yong Jang
Yu Suk Jeong
Byounghoon Seung
Seong-Yong Moon
Sang Gyun Woo
Han-Ku Cho
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