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K. Lucas
K. Lucas
IBM
Physics
Electronic engineering
Interconnection
Pullback
Random logic
2
Papers
20
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A high performance 1.5 V, 0.10 /spl mu/m gate length CMOS technology with scaled copper metallization
1998
IEDM | International Electron Devices Meeting
Percy V. Gilbert
I. Yang
C. Pettinato
M. Angyal
B. Boeck
C. Fu
T. VanGompel
R. Tiwari
T. Sparks
W. Clark
C. Dang
J. Mendonca
B. Chu
K. Lucas
M. Kling
B. Roman
E. Park
F. Huang
M. Woods
D. Rose
K. McGuffin
A Nghiem
E. Banks
T. McNelly
C Feng
John L. Sturtevant
H. de
A. Das
S. Veeraraghavan
F Nkansah
Mousumi Bhat
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Practical applications of 2-D optical proximity corrections for enhanced performance of 0.25 /spl mu/m random logic devices
1997
IEDM | International Electron Devices Meeting
H. Chuang
Percy V. Gilbert
Warren D. Grobman
M. Kling
K. Lucas
K. Reich
B. Roman
Edward O. Travis
Paul G. Y. Tsui
T. Vuong
Jeff P. West
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Citations (7)
1