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Martin Tschinkl
Martin Tschinkl
Wafer
Photolithography
Engineering drawing
Photomask
Engineering
5
Papers
2
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0
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2024
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Intra-field CDU map correlation between SEMs and aerial image characterization
2014
Guoxiang Ning
Peter Philipp
Lloyd C. Litt
Stefan Meusemann
Thomas Thaler
Kristian Schulz
Martin Tschinkl
Paul Ackmann
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Evaluation of a new generation, photomask develop system for CAR
2004
Rusty Cantrell
Martin Tschinkl
Axel Feicke
Wolfram Porsche
Gaston Lee
Tatsuhito Kotoda
Peter Tichy
Takahiro Fukai
Shigenori Kamei
Harry Asai
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Evaluation of a new-generation photomask develop system for CAR
2004
Rusty Cantrell
Martin Tschinkl
Axel Feicke
Wolfram Porsche
Gaston Lee
Tatsuhito Kotoda
Peter Tichy
Takahiro Fukai
Shigenori Kamei
Hiroshi Asai
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First photomask developer based on state-of-the-art wafer processing technology
2004
Peter Tichy
Takahiro Fukai
Shigenori Kamei
Hiroshi Asai
Tatsuhito Kotoda
Kazuhiro Takeshita
Tetsushi Miyamoto
Yoshiki Okamoto
Hideo Funakoshi
Shinji Koga
Shigemi Oono
Rusty Cantrell
Axel Feicke
Wolfram Porsche
Martin Tschinkl
Gaston Lee
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First photomask developer based on state of the art wafer processing technology
2004
Peter Tichy
Takahiro Fukai
Shigenori Kamei
Harry Asai
Tatsuhito Kotoda
Kazuhiro Takeshita
Tetsushi Miyamoto
Yoshiki Okamoto
Hideo Funakosh
Shinji Koga
Shigemi Oono
Rusty Cantrell
Axel Feicke
Wolfram Porsche
Martin Tschinkl
Gaston Lee
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