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Jane P. Chang

University of California, Los Angeles
University of California

207

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5451

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Plasma enhanced atomic layer deposition of thin film Li1+xMn2−xO4 for realization of all solid-state 3D lithium-ion microbatteries

2021 Journal of Vacuum Science and Technology
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(Invited) Gas-Phase Directional Etching of Copper Via Surface Oxidation and Chemical Complexation

2021
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Errata: “Atomic layer etching of metals with anisotropy, specificity, and selectivity” [J. Vac. Sci. Technol. A 38, 043005 (2020)]

2021 Journal of Vacuum Science and Technology
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Directional and selective patterning of EUV absorbers

2021
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Errata: ‘‘Patterning nickel for extreme ultraviolet lithography mask application I. Atomic layer etch processing’’ [J. Vac. Sci. Technol. A 38, 042603 (2020)]

2021 Journal of Vacuum Science and Technology
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Precise Control of Nanoscale Cu Etching via Gas-Phase Oxidation and Chemical Complexation

2021 Journal of Physical Chemistry C
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(Invited) Precise Control of Nanoscale Cu Etching via Gas-Phase Oxidation and Chemical Complexation

2021
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Room temperature rectification in tapered-channel thermal diodes through nanoscale confinement-induced liquid–solid phase change

2021 Journal of Applied Physics
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Patterning nickel for extreme ultraviolet lithography mask application. II. Hybrid reactive ion etch and atomic layer etch processing

2020 Journal of Vacuum Science and Technology
- Xia Sang
- Jane P. Chang
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(Invited) Conformal Deposition of Li-Based Thin Films for 3D Lithium-Ion Microbatteries

2020
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