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Ernest Chen
Ernest Chen
University of California, Los Angeles
Materials science
High fidelity
Dry etching
Critical dimension
research findings
2
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1
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Errata: ‘‘Patterning nickel for extreme ultraviolet lithography mask application I. Atomic layer etch processing’’ [J. Vac. Sci. Technol. A 38, 042603 (2020)]
2021
Journal of Vacuum Science and Technology
Xia Sang
Ernest Chen
Jane P. Chang
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Review on recent progress in patterning phase change materials
2020
Journal of Vacuum Science and Technology
Meihua Shen
Thorsten Lill
Nick Altieri
John Hoang
Steven Chiou
Jim Sims
Andrew John Mckerrow
Rafal Dylewicz
Ernest Chen
Hamid Razavi
Jane P. Chang
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