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John Hoang
John Hoang
Lam Research
Materials science
Electronic engineering
Thin film
Inductively coupled plasma
Wafer
3
Papers
7
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2024
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Review on recent progress in patterning phase change materials
2020
Journal of Vacuum Science and Technology
Meihua Shen
Thorsten Lill
Nick Altieri
John Hoang
Steven Chiou
Jim Sims
Andrew John Mckerrow
Rafal Dylewicz
Ernest Chen
Hamid Razavi
Jane P. Chang
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Citations (1)
A New Etch Planarization Technology to Correct Non-Uniformity Post Chemical Mechanical Polishing
2015
IEEE Transactions on Semiconductor Manufacturing
Meihua Shen
Baosuo Zhou
Yifeng Zhou
John Hoang
Jim Bowers
Andrew D. Bailey
Eric A. Pape
Harmeet Singh
Rich Wise
Ravi K. Dasaka
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Citations (5)
Etch planarization - A new approach to correct non-uniformity post chemical mechanical polishing
2014
ASMC | Advanced Semiconductor Manufacturing Conference
Meihua Shen
Baosuo Zhou
Yifeng Zhou
John Hoang
Jim Bowers
Andrew D. Bailey
Eric A. Pape
Harmeet Singh
R. Dasaka
Rich Wise
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Citations (1)
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