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M. T. H. Ha

National Chiao Tung University

6

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6

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First Experimental Demonstration of Negative Capacitance InGaAs MOSFETs With Hf 0.5 Zr 0.5 O 2 Ferroelectric Gate Stack

2018 VLSIT | Symposium on VLSI Technology
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Enhancing the Performance of Ni-In0.53Ga0.47As MOSFETs Using Post Silicon Dopant Process

2017
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Materials growth and band offset parameters of the Al 2 O 3 /In 0.28 Ga 0.72 Sb/AlSb/GaSb/GaAs heterostructure

2017
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Improved Performance and Sufficient Reliability In 0.53 Ga 0.47 As FinFET Using NH3 Plasma Treatment

2017
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Investigation of the Interface Stability of the Metal/HfO 2 /AlN/InGaAs MOS Devices

2017
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Effective Interface Passivation by In-Situ Remote-Plasma Gas Treatments for In 0.53 Ga 0.47 As MOSFET and FinFET Applications

2016
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