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C.-C.F. Chang
C.-C.F. Chang
Optoelectronics
Materials science
Band offset
Heterojunction
Remote plasma
2
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Materials growth and band offset parameters of the Al 2 O 3 /In 0.28 Ga 0.72 Sb/AlSb/GaSb/GaAs heterostructure
2017
S.H. Huynh
M. T. H. Ha
H.B Do
T. A. Nguyen
Y. D. Jin
J. W. Lin
K. S. Yang
C.-C.F. Chang
Q.H Luc
E. Y. Chang
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Effective Interface Passivation by In-Situ Remote-Plasma Gas Treatments for In 0.53 Ga 0.47 As MOSFET and FinFET Applications
2016
Q.H Luc
C. C. Chang
P. C. Chang
H.B Do
J. W. Lin
K. S. Yang
C.-C.F. Chang
M. T. H. Ha
S.H. Huynh
Y C Lin
E. Y. Chang
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