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I. Thomas
I. Thomas
STMicroelectronics
Nanotechnology
Gate dielectric
Metal gate
CMOS
High-κ dielectric
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28nm FDSOI high-K metal gate CD variability investigation
2014
Proceedings of SPIE
L. Desvoivres
P. Gouraud
B. Le-Gratiet
R. Bouyssou
R. Ranica
C. Gallon
I. Thomas
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