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Nai Sheng Wu
Nai Sheng Wu
National Cheng Kung University
Gate dielectric
Thin-film transistor
Gate oxide
Leakage (electronics)
Optoelectronics
4
Papers
8
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Improving the electrical and hysteresis performance of amorphous igzo thin-film transistors using co-sputtered zirconium silicon oxide gate dielectrics
2017
Materials Science in Semiconductor Processing
Chien Hsiung Hung
Shui-Jinn Wang
Pang Yi Liu
Chien-Hung Wu
Hao Ping Yan
Nai Sheng Wu
Tseng Hsing Lin
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Citations (6)
Improved stability of Co-sputtered Ti-IGZO Channel Thin-Film Transistors with Zr0.85Si0.15O2 Gate Dielectric
2017
Yen Hao-Ping
Shui-Jinn Wang
Chien Hsiung Hung
Nai Sheng Wu
Ying Chi Hung
Cheng Xiu-lin
Zhi Kai Zhuang
Ching Yi Chen
Chien-Hung Wu
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A room temperature process for the fabrication of amorphous indium gallium zinc oxide thin-film transistors with co-sputtered Zr x Si1− x O2 Gate dielectric and improved electrical and hysteresis performance
2017
Japanese Journal of Applied Physics
Chien Hsiung Hung
Shui-Jinn Wang
Pang Yi Liu
Chien-Hung Wu
Nai Sheng Wu
Hao Ping Yan
Tseng Hsing Lin
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Using co-sputtered ZrSiO x gate dielectrics to improve mobility and subthreshold swing of amorphous IGZO thin-film transistors
2016
DRC | Device Research Conference
Chien Hsiung Hung
Shui-Jinn Wang
Pang Yi Liu
Chien-Hung Wu
Nai Sheng Wu
Hao Ping Yan
Tseng Hsing Lin
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