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Hiroki Yoshikawa
Hiroki Yoshikawa
Shin-Etsu Chemical
Optics
Materials science
Lithography
Phase-shift mask
Photolithography
5
Papers
16
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Attenuated phase-shift mask with high tolerance for 193nm radiation damage
2011
Taichi Yamazaki
Ryohei Gorai
Yosuke Kojima
Takashi Haraguchi
Tsuyoshi Tanaka
Ryuji Koitabashi
Yukio Inazuki
Hiroki Yoshikawa
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Citations (2)
High resolution mask process and substrate for 20nm and early 14nm node lithography
2011
Tom Faure
Satoshi Akutagawa
Karen D. Badger
Louis Kindt
Jun Kotani
Takashi Mizoguchi
Satoru Nemoto
Kazunori Seki
Tasuku Senna
Richard Wistrom
Shinich Igarashi
Yukio Inazuki
Kazuhiro Nishikawa
Hiroki Yoshikawa
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Study and improvement approach to 193-nm radiation damage of attenuated phase-shift mask
2010
Yoshifumi Sakamoto
Tomohito Hirose
Hitomi Tsukuda
Taichi Yamazaki
Yosuke Kojima
Hayato Ida
Takashi Haraguchi
Tsuyoshi Tanaka
Ryuji Koitabashi
Yukio Inazuki
Hiroki Yoshikawa
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Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error control
2007
Yosuke Kojima
Masanori Shirasaki
Kazuaki Chiba
Tsuyoshi Tanaka
Yukio Inazuki
Hiroki Yoshikawa
Satoshi Okazaki
Kazuya Iwase
Kiichi Ishikawa
Ken Ozawa
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Improvement of CD variation control for attenuated phase-shift mask
2007
Mikio Takagi
Takashi Mizoguchi
Yosuke Kojima
Tadashi Saga
Takashi Haraguchi
Yuichi Fukushima
Tsuyoshi Tanaka
Yoshimitsu Okuda
Yukio Inazuki
Hiroki Yoshikawa
Satoshi Okazaki
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Citations (2)
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