Old Web
English
Sign In
Acemap
>
authorDetail
>
Kazuhiro Nishikawa
Kazuhiro Nishikawa
Shin-Etsu Chemical
Process window
Electronic engineering
Optics
Materials science
Lithography
3
Papers
3
Citations
0
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (3)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Development of a new high transmission phase shift mask technology for 10 nm logic node
2016
Thomas Faure
Yoshifumi Sakamoto
Yusuke Toda
Karen D. Badger
Kazunori Seki
Mark Lawliss
Takeshi Isogawa
Amy Zweber
Masayuki Kagawa
Richard Wistrom
Yongan Xu
Granger Lobb
Ramya Viswanathan
Lin Hu
Yukio Inazuki
Kazuhiro Nishikawa
Show All
Source
Cite
Save
Citations (1)
High resolution mask process and substrate for 20nm and early 14nm node lithography
2011
Tom Faure
Satoshi Akutagawa
Karen D. Badger
Louis Kindt
Jun Kotani
Takashi Mizoguchi
Satoru Nemoto
Kazunori Seki
Tasuku Senna
Richard Wistrom
Shinich Igarashi
Yukio Inazuki
Kazuhiro Nishikawa
Hiroki Yoshikawa
Show All
Source
Cite
Save
Citations (2)
Transparent conductive film for transparent touch-sensitive panel, touch-sensitive transparent panel with a transparent conductive film and method for producing a transparent conductive film
1999
Ryoumei Omote
Yoshihide Inako
Yosuke Matsukawa
Masayasu Sakane
Kazuhiro Nishikawa
Show All
Source
Cite
Save
Citations (0)
1