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R. Holly
R. Holly
EV Group
Resist
Lithography
Computer science
Optoelectronics
Photonics
2
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Maskless Lithography Optimized for Heterogeneous and Chiplet Integration
2020
B. Matuskova
B. Povazay
R. Holly
F. Bogelsack
Tobias Zenger
T. Uhrmann
B. Thallner
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Advanced Black Resist Processing and Optimized Lithographic Patterning for Novel Photonic Devices
2019
B. Matuskova
H. Taguchi
M. Weinhart
R. Holly
M. Brunnbauer
J. Rimbock
T. Zenger
M. Eibelhuber
T. Uhrmann
Y. Taguchi
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