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C. Roukoss
C. Roukoss
CMOS
Etching
High-κ dielectric
Materials science
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Etching issues with High-K Metal Gate stacks for CMOS 28nm technology
2011
F. Chave
Laurent Vallier
Pascal Gouraud
S. Baudot
C. Roukoss
Pierre Caubet
Olivier Joubert
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