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Erik A. Puttlitz
Erik A. Puttlitz
IBM
Photoresist
Materials science
Analytical chemistry
Resist
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Characterization of profile dependency on nitride substrate thickness for a chemically amplified I-line negative resist
1995
Erik A. Puttlitz
James P. Collins
Thomas M. Glynn
Leo L. Linehan
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Investigation into the origin of microbridging in chemically amplified negative-tone photoresists
1995
Leo L. Linehan
Randolph S. Smith
Judy Dorn
James Thomas Fahey
Wayne M. Moreau
Gary T. Spinillo
Erik A. Puttlitz
James P. Collins
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INR negative resist: a negative-tone I-line chemically amplified photoresist
1994
Leo L. Linehan
Gary T. Spinillo
Randolph S. Smith
Wayne M. Moreau
Barry C. McCormick
Robert Lavin Wood
Erik A. Puttlitz
James P. Collins
William J. Miller
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I-line negative resist manufacturing process qualification
1994
Erik A. Puttlitz
James P. Collins
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