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Rinus T. P. Lee
Rinus T. P. Lee
Silicide
Dopant
Optoelectronics
Nickel
Epitaxy
4
Papers
40
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Scaling Challenges for Advanced CMOS Devices
2017
International Journal of High Speed Electronics and Systems
Ajey Poovannummoottil Jacob
Ruilong Xie
Min Gyu Sung
Lars Liebmann
Rinus T. P. Lee
Bill Taylor
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Citations (40)
Novel Epitaxial Nickel Aluminide-Silicide with Low Schottky-Barrier and Series Resistance for Enhanced Performance of Dopant-Segregated Source/Drain N-channel MuGFETs
2007
Symposium on VLSI Technology
Rinus T. P. Lee
Tsung-Yang Liow
Kian Ming Tan
Andy Eu-Jin Lim
Chee-Seng Ho
Keat-Mum Hoe
M.Y. Lai
Thomas Osipowicz
Guo-Qiang Lo
Ganesh S Samudra
Dongzhi Chi
Yee-Chia Yeo
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Novel Epitaxial Nickel Aluminide-Silicide with Low Schottky-Barrier and Series Resistance for Enhanced Performance of Dopant-Segregated Source/Drain N-channel MuGFETs
2007
Symposium on VLSI Technology
Rinus T. P. Lee
Tsung-Yang Liow
Kian Ming Tan
Andy Eu-Jin Lim
Chee-Seng Ho
Keat-Mum Hoe
M.Y. Lai
Thomas Osipowicz
Guo-Qiang Lo
Ganesh S Samudra
Dongzhi Chi
Yee-Chia Yeo
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Experiences with the Balcke-Dürr plate evaporator at Tableland factory.
2003
N.J. Sichter
Rinus T. P. Lee
R.B. Tyson
Ross Broadfoot
Kameron Dunn
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